Atomic Layer Deposition
by Tommi KääriäinenDavid CameronMarja-Leena KääriäinenArthur ShermanTommi KääriäinenMarja-Leena Kääriäinen
Format: Hardcover
ISBN13: 9781118062777
Hardcover|9781118062777
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Overview
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
| ISBN-13 | 9781118062777 |
|---|---|
| ISBN-10 | 1118062779 |
| Weight | 1.25 Pounds |
| Dimensions | 6.32 x 0.82 x 9.50 In |
| List Price | $226.95 |
| Edition | 2nd Edition |
| Format | Hardcover |
|---|---|
| Language | English |
| Pages | 272 pages |
| Publisher | Wiley-Scrivener |
| Published On | 2013-05-28 |
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